The Michael J. Hoffmann Lab

Michael J. Hoffmann’s lab focuses on understanding and engineering functional ceramic and oxide materials for next‑generation electronic and energy technologies. A central research goal is to link processing, microstructure, and defects to electrical, mechanical, and functional properties, enabling materials with improved performance, reliability, and energy efficiency. A major emphasis of the lab is on ferroelectric hafnia‑ and zirconia‑based thin films, which are highly relevant for low‑power electronics. The group investigates negative capacitance effects, ferroelectric phase stability, domain dynamics, and scaling limits using a combination of experiments, compact modeling, and advanced phase‑field simulations. This work supports the development of energy‑efficient transistors, memories, and novel device concepts beyond conventional CMOS scaling. In parallel, the lab has strong expertise in ceramic processing and microstructural design. Topics include field‑assisted sintering, grain growth and grain boundary phenomena, composite ceramics, and microstructure–mechanical property relationships. These studies are relevant for applications such as solid oxide fuel cells, thermoelectric devices, dielectrics, and structural ceramics. The research addresses key societal challenges including sustainable computing, energy efficiency, and durable functional materials. The lab is well suited for students interested in materials science or engineering who enjoy combining experiments, simulations, and theory to understand complex structure–property relationships and translate them into practical technologies.